Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Over the past decade, colloidal quantum dots (QDs) have emerged as promising materials for next-generation displays due to their tunable emission, high brightness, and compatibility with low-cost ...

Continuing to rely on 193nm immersion lithography with multiple patterning is becoming much more difficult at 7nm and 5nm. With the help of various resolution enhancement techniques, optical ...

When I first began working on double-patterning (DP) tools back in late 2010, there was already talk that it might be a fruitless, or at a minimum, very short-lived project, as extreme ultraviolet ...

What's more useful: a quick and easy nanoscale fabrication method that yields lots of loosely assembled products, or a painstaking procedure for making robust structures one molecule at a time? This ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

Recently, a research team led by Prof. LI Yue from Hefei Institutes of Physical Science (HFIPS), Chinese Academy of Sciences (CAS) has introduced a self-confined solid-state dewetting mechanism. This ...

Applied Materials AMAT introduced a slew of new products in a bid to boost its patterning solutions portfolio. Notably, the company launched the Sym3 Y Magnum etch system to improve chip performance ...

Background Precise and accurate field methods for body composition analyses in athletes are needed urgently. Aim Standardisation of a novel ultrasound (US) technique for accurate and reliable ...